| 摘要 |
PURPOSE:To perform the correction of a crosssectional measurement and a shot position of the beam in a short time by correcting an expansion caused by proximity effect of a pattern and by a ratio of lateral and longitudinal lengths by a mechanical means. CONSTITUTION:A CPU10 outputs data of a position of a pattern and a measurement of a slit and the data corresponding to the rank is read out from a correction data memory 16 and is sent to resistors 19 and 20 after correcting an expansion caused by proximity effect through a multiplier 17, an adder 18, a substractor 15 and an adder 14. The data corresponding to the rank from a memory 23 is read out from the memory 16 and the expansion caused by the ratio of longitudinal and lateral lengths of the pattern is corrected through a multiplier 22, a subtractor 21, a divider 24 and an adder 23. Then the corrected data of a slit measurement X2'', Y2'' and of beam shot position X1'', Y1'' are obtained by resistors 25 and 26. The data is sent to a measurement determination deflector 6 and a position determination deflector 9 to achieve drawing of the pattern of the predetermined measurement X2, Y2 at the predetermined position SO (X1, Y1). |
