发明名称 SUBSTRATE HEATING APPARATUS
摘要 PURPOSE:To perform simple regeneration so as to be capable of uniformly heating a substrate to be heated, by a method wherein a pipe for exhausting non- condensible gas is hermetically connected to the hermetical container of a substrate heating apparatus and the other end of the pipe is hermetically sealed to the outside so as to open said pipe only when the gas is exhausted. CONSTITUTION:A heating medium 5 receiving heat supply from a heater 6 is gasified in a degassed mandrel 3 to be converted to heating medium vapor which in turn makes the surface temp. of the mandrel 3 uniform over the entire surface thereof to uniformly heat the substrate 7 mounted to the periphery of the mandrel 3. A pipe 14 for exhausting non-condensible gas is hermetically connected to the mandrel 3 and the other end of the pipe is hermetically sealed from the outside of the pipe. When non-condensible gas is present in the mandrel 3 by some cause, the mandrel 3 is heated to a temp. higher than the b.p. of the heating medium 5 and rotated so as to bring the root of the sealing part 14a of the pipe 14 to an uppermost position and, after the sealing part 14a is cut to exhaust the non-condensible gas, it is again perfectly sealed.
申请公布号 JPS59197563(A) 申请公布日期 1984.11.09
申请号 JP19830072576 申请日期 1983.04.25
申请人 RICOH KK 发明人 AOZUKA RIKIO
分类号 C23C14/50;C23C14/54;G03G5/082 主分类号 C23C14/50
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