| 摘要 |
An aqueous acidic trivalent chromium electrolyte and process for electrodepositing chromium platings comprising an electrolyte containing trivalent chromium ions, a complexing agent, halide ions, ammonium ions and a reducing agent comprising an ion selected from the group consisting of scandium, yttrium, lanthanum, titanium, zirconium, hafnium, molybdenum, arsenic, selenium, tellurium, cerium, uranium, and tin present in an amount effective to maintain the concentration of hexavalent chromium ions formed in the bath at a level at which satisfactory chromium electrodeposits are obtained.
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