发明名称 ELECTROLYTIC ETCHING METHOD
摘要 PURPOSE:To increase the electrolytic speed of an anode part to the electrolytic speed or more of the other anode part by irradiating a part of the anode with laser beam while an electrolytic etching is being performed. CONSTITUTION:The material to be processed is used as an anode 2, the anode 2 is opposed to a cathode 3 in an electrolyte, and an etching process is performed electrochemically on the anode 2 applying electricity between electrodes 2 and 3. At that time, the electrolytic etching is performed while a laser beam 7 is made to irradiate on the part whereon the concaved part or a hole part of the anode 2 will be formed. As a result, the electrolytic speed of the irradiated anode part is accelerated to that or in excess of the other anode part, thereby enabling to partially form a concaved part or a hole part.
申请公布号 JPS59175127(A) 申请公布日期 1984.10.03
申请号 JP19830049205 申请日期 1983.03.24
申请人 DAINIPPON INSATSU KK 发明人 HASHIMOTO TAKAO
分类号 H01L21/3063;H01L21/306;(IPC1-7):H01L21/306 主分类号 H01L21/3063
代理机构 代理人
主权项
地址