| 摘要 |
PURPOSE:To enable the formation of thin films on both surfaces in a single step, by constituting a vacuum tank with a plurality of chambers, e.g. six chambers, and inhibiting the inflow of contaminating gases formed from a film supporting body wound into a roll into sputtering chambers. CONSTITUTION:The apparatus is constituted with a vacuum tank having a chamber 1 for sending out a supporting body, a plurality of, for instance four, chambers 2, 3, 4, 5 continuously provided in a state shifted vertically right and left or longitudinally right and left from each other, a chamber 6 for winding a supporting body, cylindrical cans 22, 23, 24, 25 provided in each sputtering chambers 2-5 in a manner such that adjacent two are rotated in opposite direction to each other, sputtering target electrodes 51-62 provided around said cylindrical cans 22-25 and a winding roll 26 for carrying a filmy supporting body 15 set in the chamber 1 for sending out a supporting body along the cylindrical cans 22-25 and then winding it in the chamber 6 for winding a supporting body. |
