发明名称 MANUFACTURE OF DUPLICATING MASTER BLOCK
摘要 PURPOSE:To manufacture a duplicating master block having high fidelity pattern transferability and excellent durability, by forming a duplicating master block made into a unitary body from an electrode and a plating film on a rugged photosensitive resin film, and applying the ion beams of rare gas to said duplicating master block from the surface of the electrode layer. CONSTITUTION:A Cr film 10 and a Ni film 11 are sequentially applied onto a negative plate 1 comprising a substrate 2 and a photosensitive layer 3 in which data (ruggedness) have been recorded by a vapor deposition process. These films 10, 11, 12 are peeled off the substrate 2, and the adherent photosensitive layer 3 is further removed, to obtain a duplicating master block 13 equal to the pattern of the negative plate 1. Thereafter, beams such as xenon ion are applied onto the duplicating master block 13 from the surface of the Cr electrode 10 by rare gas such as xenon using an ion implantation device, to form mixed layers 14, 15 at the boundaries between the Ni film 11 and the Cr film 10 and between the Ni film 11 and the plating film 12. Hence, adhesiveness between the adjacent layers is improved.
申请公布号 JPS59173287(A) 申请公布日期 1984.10.01
申请号 JP19830047367 申请日期 1983.03.22
申请人 FUJITSU KK 发明人 NAKAJIMA MINORU;HAMADA MITSURU
分类号 G11B7/26;C25D1/10;G11B3/70;G11B9/06;G11B11/00 主分类号 G11B7/26
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