| 摘要 |
PURPOSE:To give an easy orientation to a wafer with a simple mechanism, by providing the apparatus with a mechanism to orientate the wafer in a specific direction, and further by adapting the orientation mechanism to be applicable to different sizes of wafers. CONSTITUTION:If a wafer U is fed from above the drawing, the wafer U is horizontally shifted being mounted on the belt 10 and carried in until the same abut on the orientation guide 8 and the rotating roller 9. The wafer U in abutment on the rotating roller 9 is rotated by the rotating roller 9 until the detecting device 20 detects that the orientation flat F is in engagement with the orientation guide 8, when the control circuit causes the motor 16 to stop and the wafer is thereby stopped. Then, the clamper 5 is lowered and holds the wafer U between the same and the wafer holder 2, and thereupon the motor 4 starts its rotation to cause the wafer holder 2 to turn substantially upright and then an ion beam is irradiated on the wafer U. After the ion implantation is finished, the wafer holder 2 is returned to the horizontal position and the wafer U is carried out by the belt 10. |
