| 摘要 |
PURPOSE:To obtain a colored pattern high in performance by using a combination of a resist developable even in poor solvents and a dye unchangeable in optical charcateristics due to the developing solvent of the resist. CONSTITUTION:A colored pattern 4 is formed by a step for forming a resist mask 2 on a substrate with a positive type resist composed essentially of F- contg. metharcrylate monomer units represented by structural formula I ; a step for vapor depositing a dye selected from perylenetetracarboxylic acid derivatives represented by structural formula II to form a dye layer 3 on the mask 2; and a step for removing the resist mask 2 from the substrate 1 and at the same time the dye layer 3 on its upside, too. A colored pattern having colored patterns 4, 5, 6 is prepared by repeating these steps. In formulae I and II, R1, R2 are each H or alkyl, R3 is an alkyl group having each C combining with at least one F, and R4 is H, alkyl, or one of various kinds of aryl groups. |
