| 摘要 |
PURPOSE:To enable in-process monitoring of the thickness of a sputtering film with high accuracy by enclosing a film thickness sensor and the signal line thereof with a shielding case and eliminating the influence of the high frequency used for sputtering. CONSTITUTION:A sputtering device consists of a sputtering target 4 continuous with a high frequency power source, a substrate holder 5, a film thickness sensor 6, and a shielding case 13 having the opening of a metal screen 14 formed of a conductive material. Said sensor 6 has a crystal oscillator placed oppositely to the target 4. Said case 13 encloses the sensor 6 and the signal wire thereof and the opening of the case 13 allows the passage of sputtering particles to the target 4 side, thereby blocking high frequency noise. |
