发明名称 METHOD FOR RECOGNITION AND DISCRIMINATION OF NON-DEFECTIVE IC IN WAFER
摘要 PURPOSE:To accurately give a decision on a wafer whether it is defective or non-defective by a method wherein a non-defective IC wafer is adhered on glass and the like, IC chips are formed by performing a dicing, a binary signal is obtained by irradiating a beam of light, and a plurality of binary judging areas are provided in the same visual field when a defective-or-nondefective decision is determined. CONSTITUTION:A non-defective IC wafer 3 is adhered on a substrate 1 consisting of glass and the like using a glass cloth 2 wherein thermoplastic wax is impregnated. Then, individually formed chips 10, 11 and so on are obtained by performing a dicing, a beam of light is diagonally irradiated on each chip from a lamp 5 over a press-plate 4, and a defective or non-defective decision is given by a binary system 8 using a prism 6, a camera 7 and the like. However, for the purpose of preventing to give a decision in such a manner that a chip will be present on parts 12 and 13 whereon the glass cloth is exposed, a recognition range showing the bad mark surrounded by lines 20-23 and another recognition range surrounded by cursol lines 24-27 are provided in the visual field of a chip.
申请公布号 JPS59115534(A) 申请公布日期 1984.07.04
申请号 JP19820228196 申请日期 1982.12.23
申请人 SUWA SEIKOSHA KK 发明人 SHIRAKI AKISHI
分类号 H01L21/66;H01L21/02;H01L21/60 主分类号 H01L21/66
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