发明名称 |
Etch solution and method |
摘要 |
In manufacturing a circuit which includes the step of etching a polymeric material in the presence of exposed metallic conductors, the polymer is etched with an aqueous solution comprising chromic acid [which may be added in the form of chromic oxide (CrO3)], sulfuric acid, phosphoric acid and water wherein the water added does not exceed 55 volume percent of the total volume.
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申请公布号 |
US4457951(A) |
申请公布日期 |
1984.07.03 |
申请号 |
US19830546713 |
申请日期 |
1983.10.28 |
申请人 |
AT&T TECHNOLOGIES, INC. |
发明人 |
D'AMICO, JOHN F.;DEANGELO, JR., MICHAEL A. |
分类号 |
C23C18/24;H05K3/18;H05K3/38;(IPC1-7):B29C17/08;C03C15/00;B44C1/22;B05D5/12 |
主分类号 |
C23C18/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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