| 摘要 |
PURPOSE:To form narrowly with high accuracy the gap width of the tip part of a pattern by a process in which a stripe-like pattern is transferred to a thin metallic film by a lift-off method, and thereafter, an isolated pattern is formed by using a continuous body pattern as a mask. CONSTITUTION:A thin soft magnetic film 32 is vapor-deposited on a substrate 31, the first spacer layer 33 is laminated on said film, a stripe-like pattern 36 is obtained by transferring a stripe-like pattern 34 on a thin metallic film by a lift- off method, and an isolated pattern 38 is formed by using a continuous body pattern 37 crossing said pattern 36 as a mask, and etching the thin metallic film. The first spacer layer 33 is etched by using this isolated pattern 38 as a mask, and the isolated pattern is transferred to the first spacer layer 33. Subsequently, the thin soft magnetic film 32 is etched by using the transferred isolated pattern 38 as a mask, and the first spacer layer 33 is peeled off, by which a soft magnetic material pattern 40 having a gap of high accuracy is obtained. |
