| 摘要 |
PURPOSE:To provide a vapor deposition device of film which facilitates the manufacture, maintenance and control of a main chamber by supporting a field chamber, via a supporter with bolts, on the outside circumference of a main cylinder of the main chamber. CONSTITUTION:In the film vapor deposition device a main chamber 3 which encloses a metallic electrode 2 and an object 4 to be treated and has a field coil layer 5 on the outside peripheral part is formed separately from a main cylinder 6 and the layer 5. Bosses 9 inscribed with internal screws 8 are radially projected on the outside peripheral surface of the body 6, and a supporter 12 having bolts 11 provided with insulation caps 10 is screwed to the bosses 9 freely movably forward and backward in the centripetal and centrifugal directions thereof, whereby a field chamber 7 is supported via the supporter 12 on the outside circumference of the body 6. The body 6 and the chamber 7 are thus easily positioned concentrically whereby the distance in the radial direction between the layer 5 and the electrode 2 is made constant. |
