发明名称 2-(HALOGENOMETHYL-PHENYL)-4-HALOGENO-OXAZOLE DERIVATIVES, A PROCESS FOR THE PREPARATION THEREOF, AND RADIATION-SENSITIVE COMPOSITIONS CONTAINING THESE DERIVATIVES
摘要 <p>This invention relates to a novel 2-(halogenomethyl-phenyl)-4-halogeno-oxazole derivative; to a radiation-sensitive composition which, as the radiation-sensitive compound, contains a 2-halogenomethyl-phenyl)-4-halogeno-oxazole derivative; and to a process for the preparation of the novel 2-(halogenomethyl-phenyl)-4-halogeno-oxazole derivatives. The novel 2-(halogeno-methyl-phenyl)4-halogeno-oxazole derivative has the general formula I I wherein Hal1 is a halogen atom, Hal2 is a chlorine or bromine atom, m is an integer from 1 to 3, n is an integer from 1 to 4, R1 is a hydrogen atom or a further CH3-mHal2m group, and R2 is a 1-valent or 2-valent, at most tetranuclear aromatic or heteroaromatic radical which may be partially hydrogenated, and at an unsaturated ring carbon atom, is linked, directly or via a chain which contains up to four exclusively unsaturated carbon atoms, to the oxazolyl part of the molecule according to the general formula I.</p>
申请公布号 CA1168656(A) 申请公布日期 1984.06.05
申请号 CA19810378868 申请日期 1981.06.02
申请人 HOECHST AKTIENGESELLSCHAFT 发明人 DOENGES, REINHARD
分类号 C08F2/00;C07D263/34;C07D263/56;C07D263/57;C07D413/04;C08F2/48;C08F2/50;C08F2/54;G03C1/675;G03F7/004;G03F7/028;G03F7/039;(IPC1-7):C07D263/34;C07D413/00;G03C1/72 主分类号 C08F2/00
代理机构 代理人
主权项
地址