发明名称 CONTINUOUS VACUUM DEPOSITION DEVICE
摘要 PURPOSE:To enable continuous and satisfactory plating on one side of a steel strip by disposing a deposition preventive plate which is heated to the reevaporation temp. of a plating metal or above on the non-plating side of the steel strip in a vacuum deposition chamber in parallel in proximity to the steel strip. CONSTITUTION:A deposition preventive plate 110 having the width equal to the width of a steel strip 102 or below is installed as near the strip 102 as possible in parallel therewith on the non-plating side of the strip 102 without contact therewith. The plate 110 is heated by a heater 111 to the reevaporation temp. of a molten metal 106 for plating or above and vapor deposition is performed in this state. Then the vapor, which spreads upward without causing deposition on the bottom surface of the strip 102, of the part of the vapor 112 generated from a crucible 105 for evaporation is blocked by the plate 110 and is prevented from deposition to the top surface of the strip 102. Since the plate 110 is heated, the trouble such as the contact of the plating metal with the top surface of the strip 102 owing to the deposition thereof is prevented.
申请公布号 JPS5996264(A) 申请公布日期 1984.06.02
申请号 JP19820204553 申请日期 1982.11.24
申请人 MITSUBISHI JUKOGYO KK 发明人 YANAGI KENICHI;TAGUCHI TOSHIO;WADA TETSUYOSHI;NAKAMURA YOSHIMITSU;FURUKAWA HEIZABUROU;WAKE KANJI
分类号 C23C14/56;C23C14/04 主分类号 C23C14/56
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