发明名称 PREPARATION OF QUARTZ MATERIAL
摘要 PURPOSE:To prevent deformation of a quartz material caused by heat treatment, by irradiating falling melted quartz with laser beam from an OH laser device, so that an OH group in quartz is taken out of the quartz. CONSTITUTION:The quartz powder 1, a raw material for a quartz material, is dropped, melted by the oxyhydrogen burners 2 and 3, and set in a mold to give the quartz material 5. In the operation, the falling melted quartz 4 is irradiated with the laser beam 7 from the OH laser device 6, an OH group in the quartz 4 is excited, and taken out of the quartz, to reduce the OH group. Consequently, the quartz material has a softening point free from depression, and will not be deformed in a heat treatment process to form an active element of a liquid crystal panel.
申请公布号 JPS5954633(A) 申请公布日期 1984.03.29
申请号 JP19820164450 申请日期 1982.09.21
申请人 SUWA SEIKOSHA KK 发明人 OGATA TOSHIAKI
分类号 C03B20/00;C03B19/01;C03C3/06;C04B35/14;C04B35/653;G02F1/13 主分类号 C03B20/00
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