发明名称 POSITIVE TYPE PHOTOSENSITIVE COMPOSITION
摘要 PURPOSE:To obtain a photosensitive compsn. not producing gas during exposure, insensitive to thermal load, and not causing vagueness, by adding one of 4-(nitrophenyl)-1,4-dihydropyridines together with an alkali-soluble polymer. CONSTITUTION:At least one of compds. having formulae I , II (R is H or alkyl, R' is alkyl, and n is 1 or 2) combined with an alkali-soluble polymer, such as phenol novolak resin, polyhydroxystyrene, or styrene-maleic anhydride copolymer, is dissolved in a solvent to form a photosensitive soln. An aluminum support is coated with this soln. and dried to obtain a positive type photosensitive material. This does not cause foaming during exposure, causing no peeling of the photosensitive layer from the support, and no vagueness and it does not leave remainder not dissolved in an alkaline developer on the exposed areas, and a superior image is always obtained.
申请公布号 JPS58223147(A) 申请公布日期 1983.12.24
申请号 JP19820106447 申请日期 1982.06.21
申请人 FUJI YAKUHIN KOGYO KK 发明人 ASANO TAKATERU
分类号 G03C1/72;G03C1/73;G03F7/004;G03F7/039 主分类号 G03C1/72
代理机构 代理人
主权项
地址