发明名称 Photosensitive lithographic plate with sulfonate containing photosensitive polyester
摘要 A photosensitive lithographic plate having, on a substrate, a photosensitive layer comprising a photosensitive polyester containing at least (A): (a) an aromatic dicarboxylic acid unit represented by the general formula: <IMAGE> (I) where m and n each represents an integer of 0 or 1, with at least one of them being 1, (b) a dicarboxylic acid unit having a sulfonate group, and (c) a diol unit represented by the general formula: <IMAGE> (II) represents a hydrogenated benzene ring, R1 and R2 each represents an alkylene group of 2-4 carbon atoms, R3 and R4 each represents a hydrogen atom or an alkyl group of 1-6 carbon atoms, r and s each represents an integer of from 0 to 3 and t represents an integer of 0 or 1.
申请公布号 US4421841(A) 申请公布日期 1983.12.20
申请号 US19820398442 申请日期 1982.07.14
申请人 MITSUBISHI CHEMICAL INDUSTRIES LIMITED 发明人 SHIMIZU, SHIGEKI;OSHIMA, AKINOBU
分类号 C08G63/688;G03F7/032;G03F7/038;(IPC1-7):G03C1/68;C08G18/00;C08G63/00;C08G69/00 主分类号 C08G63/688
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