发明名称 MANUFACTURING DEVICE FOR SEMICONDUCTOR
摘要 PURPOSE:To prevent diffusion extending over a wide range of an offensive odor by providing an exhaust port for an effluent tank communicated with a resist- liquid applying chamber with a deodorizing instrument filled with activated carbon while mounting a resist applying section and a baking section with a suction duct. CONSTITUTION:A wafer 11 carried to the resist applying section 14 is fixed to a chuck 23 by vacuum adsorption. A cup 25 is moved upward, and combined and unified with a plug 26, and a periphery of the wafer 11 is brought to a closed state. A resist liquid is dropped from a nozzle 28 fitted to the plug 26, and the resist liquid is distributed uniformly through the revolution of a motor 24. An odor from the resist liquid scattered and an organic solvent passes through a discharge pipe 27 and is forwarded to the effluent tank 30, and is deodorized by the deodorizing instrument 32 set up to the exhaust port 31 for the tank 30 and is discharged. An odor generated by the baking section 17 in case of heating and drying is drawn into the suction duct 19, and permeates forcibly to the deodorizing instrument 33 and is discharged.
申请公布号 JPS58206123(A) 申请公布日期 1983.12.01
申请号 JP19820088576 申请日期 1982.05.25
申请人 TOKYO SHIBAURA DENKI KK 发明人 ANAMI TOSHIO;GOTOU YUUJI
分类号 G03F7/26;G03F7/16;H01L21/027;(IPC1-7):01L21/30 主分类号 G03F7/26
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