FILM FORMATION APPARATUS FOR SEMICONDUCTOR WAFER,申请号JP19970188522-传众专利搜索

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发明名称	FILM FORMATION APPARATUS FOR SEMICONDUCTOR WAFER
摘要
申请公布号	JPH1131661(A)	申请公布日期	1999.02.02
申请号	JP19970188522	申请日期	1997.07.14
申请人	TOSHIBA MICROELECTRON CORP;TOSHIBA CORP	发明人	SAKAYA KAZUHIRO;HONMA TSUTOMU;TSUCHIYA TADATOSHI;IGUCHI KOJI;YAMADA AKIHIRO
分类号	C23C16/44;C23C16/455;H01L21/205;(IPC1-7):H01L21/205	主分类号	C23C16/44
代理机构		代理人
主权项
地址

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