发明名称 PHOTOENGRAVING METHOD BY DIRECT ETCHING
摘要 PURPOSE:To produce a gravure plate economically in a photoengraving method by direct etching, by using a halftone negative for gravure as an original plate thereby averting the adverse influence of dust, etc. attached thereon in the printing stage and omitting a varnishing stage. CONSTITUTION:This method consists of (1) forming a light-curable photosensitive film 24 on the copper surface 22 on the surface of a cylindrical base body, (2) exposing the picture image of a halftone negative 26 for gravure as an original plate to form a latent image on the film 24, (3) developing the image by using a developing soln. of hydrocarbon or the like to remove the unexposed part of the film 24, (4) forming a corrosion resistant metallic layer 28 on the exposed surface of the plate material (land part), (5) removing the remaining film 24 with an alkali stripping agent or the like, (6) etching the exposed surface 22 with an etching soln. to form a travure cell 30, (7) removing the layer 28 from the plate material, (8) forming a layer 31 of an abrasion resistant metal (Cr, Ni, etc.) uniformly over the entire surface of the plate material exposed with the copper surface and (9) using the same for printing.
申请公布号 JPS58178357(A) 申请公布日期 1983.10.19
申请号 JP19820060674 申请日期 1982.04.12
申请人 DAINIPPON INSATSU KK 发明人 TACHIBANA EIICHI;KATSUTA TETSUROU
分类号 B41C1/02;G03F5/20 主分类号 B41C1/02
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