发明名称 FORMING METHOD OF SHADOW MASK TYPE PHOSPHOR SCREEN
摘要 PURPOSE:To release the assembling accuracy of an electron gun, by forming a photo-absorbing film while utilizing a through-hole for an electron beam thus separating the intervals among the phosphor R, G, B thereby increasing the impinging margin of the electron beam against the phosphor material. CONSTITUTION:The portion on which the photo-absorbing film is formed is an concave 33 while the portion to be applied with phosphor material is remained of resist 31 to become convex. Then carbon 34 is coated entirely on said resist 31 and concave section 33, and said positive resist 31 is removed by 3% NaOH aqueous solution thereafter it is developed to peel the yet-exposed resist and the carbon simultaneously to produce an absorbing film 34a stripe. The size of said film 34a will vary freely depending on the exposure and regulated by the strength of the light source. The phosphor material (film) of R, G, B for each color is formed regularly and sequentially between said films 34a to produce a phosphor screen 35 associated with absorbing film.
申请公布号 JPS58169844(A) 申请公布日期 1983.10.06
申请号 JP19820051410 申请日期 1982.03.31
申请人 TOKYO SHIBAURA DENKI KK 发明人 KOIKE NORIO;ISORI KUNIHIRO;TAKAMI SHIYOUZOU
分类号 H01J9/227 主分类号 H01J9/227
代理机构 代理人
主权项
地址