| 发明名称 |
PROTECTION OF EVAPORATION DEPOSITION METAL LAYER |
| 摘要 |
<p>The use of organic materials containing carbonyl groups (which are not part of carboxyl group), phenoxy groups, ester groups, or alcohol groups over vapor deposited metal layers improves their mar resistance. These organic materials can improve the properties of the metal layer when used in photoresist imaging films.</p> |
| 申请公布号 |
JPS58164778(A) |
申请公布日期 |
1983.09.29 |
| 申请号 |
JP19830027509 |
申请日期 |
1983.02.21 |
| 申请人 |
MINNESOTA MINING & MFG CO |
发明人 |
BAABARA MEI SHIIDAABAAGU;EDOWAADO JIYOSEFU DAUNINGU;RICHIYAADO SOROMON FUITSUSHIYU |
| 分类号 |
C23C14/06;B05D7/24;B32B15/04;C23C14/12;C23C14/56;C23C14/58;G03F7/11 |
主分类号 |
C23C14/06 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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