| 摘要 |
PURPOSE:To obtain an all-environment type photoconductive material superior in optical fatigue resistance and durability, by forming an amorphous photoconductive layer composed of the first layer region cong. O and the specified second layer region on a substrate. CONSTITUTION:A photoconductive amorphous layer 102 composed essentially of Si and contg. H or contg. halogen on a substrate 101 to obtain a photoconductive material 100. The layer 102 consists of the second layer region 103 of 3-5,000nm thickness contg. an element of group V of the periodic table in a distribution of concn. C kept at a constant concn. C1 from an interface position tB in contact with the surface of the substrate 101 to a position t1 and gradually decreasing from a concn. C2 to a concn. C3 in a range from the position t1 to an interface position tT in contact with the first layer region 104 of 0.2-95mum thickness, and this region 104 contg. O as a component. |
