| 摘要 |
An exposure mask 9 for photographic material 4 includes a measuring wheel 23 and two adjustable mask blades 19 and 20. Movement of the photographic material 4 causes rotation of the wheel 23, which causes a switching member 34 to approach a switch 42. When the switching member 34 reaches the switch 42 it stops the transport of the material 4. Adjustment of one mask blade 20 adjusts the initial distance between the switching member 34 and the switch 42.
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