| 发明名称 |
A PHOTOMASK AND METHOD OF FABRICATING SAME. |
| 摘要 |
<p>A photomask (30) used to form patterns on a resist coated semiconductor wafer is comprised of a transparent baseplate (31) having a thin metallic pattern (32) thereon; a transparent, planar coverplate (33) in intimate contact with the patterned baseplate (31) and an index matching fluid (34) interposed therebetween.</p> |
| 申请公布号 |
EP0068012(A4) |
申请公布日期 |
1983.07.04 |
| 申请号 |
EP19820900445 |
申请日期 |
1981.12.17 |
| 申请人 |
WESTERN ELECTRIC COMPANY, INCORPORATED |
发明人 |
BANKS, EDWARD LAWRENCE;TRUAX, BRUCE EDWARD;WATKINS, LAURENCE SHRAPNELL |
| 分类号 |
G03F1/48;(IPC1-7):B32B3/22;B32B31/06;G03C5/00 |
主分类号 |
G03F1/48 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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