发明名称 PHOTOSENSITIVE MIXTURE AND PHOTOSENSITIVE COPYING MATERIAL PRODUCED THEREFROM
摘要 Disclosed is a light-sensitive mixture comprising (a) a 1,2-quinonediazide or a mixture of (a1) a compound forming an acid on exposure and (a2) a compound having at least one C-O-C bond cleavable by acid; (b) a water-insoluble binder soluble in aqueous-alkaline solutions; (c) a photolytically cleavable organic halogen compound of one of the formulae <IMAGE> I <IMAGE> II in which R1 denotes an aromatic radical bonded directly or via a conjugated chain, and X denotes a halogen atom; and (d) an azo dyestuff containing at least one nitro group in the molecule. Also disclosed are light-sensitive copying materials produced from these mixtures.
申请公布号 JPS5887553(A) 申请公布日期 1983.05.25
申请号 JP19820194790 申请日期 1982.11.08
申请人 HOECHST AG 发明人 PAURU SHIYUTAARUHOOFUEN
分类号 G03C1/72;G03F7/004;G03F7/022;G03F7/105;G03F7/26 主分类号 G03C1/72
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