| 摘要 |
PURPOSE:To produce photomasks to be used in the production of semiconductors inexpensively without waste by forming the outside shape thereof to a hexagonal or higher polygonal shape having at least a pair of parallel sides. CONSTITUTION:A photomask 4 of a hexagonal or higher polygonal shape, for example, an octagonal shape is adapted for a semiconductor wafer 3. Since there are no wasteful parts that deviate from the wafer 3 in the photomask 4, the costs of materials are reduced by about 22% as compared to conventional photomasks of a square shape. For the purpose of positioning the photomask to the mask holder of an exposure machine or to the wafer 3 in the actual manufacture, at least a pair of parallel sides are required for the photomask 4. |
