发明名称
摘要 PURPOSE:To render the deposition of a shadow mask to a mask frame stable, by depositing the shadow mask and the mask frame mutually together, then annealing both of them at a high temperature in the gas atmosphere. CONSTITUTION:A shadow mask 1 is attached, by spot-welding, to a mask frame 2 to which springs 3 are deposited in order to constitute a shadow mask structure 4. Next, the shadow mask structure 4 spanning a rack 5 is supported by springs 3 and fixed parts thereof. Said structure 4 is subjected to heat-treatment at the temperature of 550-590 deg.C in the denatured gas containing Co and O2 for about 15min, then the removal of a residual strain and blacking treatment are simultaneously carried on. Consequently, the shadow mask and the mask frame are welded before the annealing and the formation of blackened film, so the deposited condition of the both after the heat-treatment becomes stable.
申请公布号 JPS5818734(B2) 申请公布日期 1983.04.14
申请号 JP19810006923 申请日期 1981.01.19
申请人 MATSUSHITA ELECTRONICS CORP 发明人 NAKAGAWA JINZO;ASHIZAKI SHIGEYA;MORYAMA GIICHI
分类号 H01J9/14 主分类号 H01J9/14
代理机构 代理人
主权项
地址