发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To obtain a photosensitive resin composition unrestrainable in photohardening reaction even when exposed in the air, by using a mixture of a specified polymer having ethylenically unsatd. bonds in the side chains, a photosensitizer, and when needed, a functional olygomer having a vinyl group in the end of the molecule. CONSTITUTION:A photosensitive resin composition contains (A) a polymer having ethylenically unsatd. bonds in the side chains, (B) a photo sensitizer such as benzoin, and when needed, (C) a multifunctional olygomer having a vinyl group in the end of the molecule, such as diethylene glycol diacrylate. The polymer (A) is obtained by adding an ethylenically unsatd. compd. contg. an oxilane ring to the carboxyl groups of a copolymer having as structural units unsatd. carboxylic acid and (meth)acrylate contg. a cyclic compd. of formulaIin which R1 is H or methyl; R2 is one of formula II-V; R3 is H or methyl; m is an integer of 0-6; when m is 1, n is 2-5, and when m is 2-6, n is 2.
申请公布号 JPS5854337(A) 申请公布日期 1983.03.31
申请号 JP19810154404 申请日期 1981.09.28
申请人 SEKISUI KAGAKU KOGYO KK 发明人 YANAGISAWA KUNIO;TASHIRO KATSUMI
分类号 C08F2/00;C08F2/48;C08F32/00;G03F7/033;G03F7/038 主分类号 C08F2/00
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