| 摘要 |
<p>Disclosed is an apparatus for treating the surface of a material in a gas plasma generated by microwave discharge. The apparatus comprises a microwave generator, a waveguide for transmitting the microwave generated from the microwave generator, a closed vessel housing a material to be treated, means for introducing a gas into the closed vessel, means for withdrawing the gas from the closed vessel, an antenna means inserted at least partially into the closed vessel, said antenna means serving to pick up the microwave from the waveguide and to deliver said microwave into the closed vessel for producing a gas plasma, and a cylindrical body formed of a microwave-transmitting material, mounted to the closed vessel in an air-tight fashion, and surrounding the antenna means at the portion inserted into the closed vessel.</p> |
