发明名称 PRINTING METHOD ON SEMICONDUCTOR SUBSTRATE
摘要 PURPOSE:To control a semiconductor manufacturing process (semiconductor substrate working process) by a method wherein process control marks and process completion marks are printed on the circumference of a semiconductor substrate. CONSTITUTION:Process control marks, A1, A2, ...showing a semiconductor manufacturing process are printed on the circumference of a wafer 11 by a laser beam or the like. Whenever each process is completed, dots 22 as process completion marks are printed around the schedule control marks by a laser beam or the like. A computer reads the abbreviation of a process name to perform process control. When the computer is failed, an operator judges the processing speed by observing the process completion marks.
申请公布号 JPS5848414(A) 申请公布日期 1983.03.22
申请号 JP19810146548 申请日期 1981.09.17
申请人 TOKYO SHIBAURA DENKI KK 发明人 SATOU MITSUO
分类号 H01L21/02;(IPC1-7):01L21/02 主分类号 H01L21/02
代理机构 代理人
主权项
地址