| 摘要 |
PURPOSE:To contrive the reduction of processing time by a method wherein a beam outline diagram is converted into a beam center diagram reduced by the radius of an electron beam by an image dotted pattern generator while it is also converted into dotted pattern data. CONSTITUTION:The beam outline diagram of a designed pattern is stored in an image drawing data memory device 13 from a control computer 11 through an interface 12. Next, dotted pattern conversion from a beam outline diagram is performed while applying the process of a quantizing error by an image dotted pattern generator 14 connected to the image drawing data memory device and this is stored in an image dotted pattern memory device 15. A control unit 17 is provided at the next stage of the image dotted pattern mameory device and is also connected to a reading section 16 synchronized with the stage control of an image drawing sample 18 to control the operation of each device and a desired design pattern is formed on the image drawing sample 18. |
