发明名称 SYSTEM INCLUDING IMPROVED CATHODE FOR CONTINUOUS DEPOSITION OF AMORPHOUS MATERIAL
摘要 A cathode for use in a glow discharge chamber. A top surface electrode is adapted to provide a substantially uniform distribution of reaction gases at the active surface of an overlying substrate as it advances through the chamber. A plurality of baffles within the cathode creates equal path lengths for reaction gases from their source to the surface electrode and from the surface electrode to a vacuum. The electrode is electrically insulated from a plurality of gas exits so that the generation of plasma is confined solely to a region between the electrode and the active surface of the substrate.
申请公布号 ZA8201709(B) 申请公布日期 1983.02.23
申请号 ZA19820001709 申请日期 1982.03.15
申请人 ATLANTIC RICHFIELD CO 发明人 MASATSUGU IZU;BARNARD T;GATTUSO D;OVSHINSKY H
分类号 H01L31/04;C23C16/509;C23C16/54;H01L21/205 主分类号 H01L31/04
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