发明名称 |
SYSTEM INCLUDING IMPROVED CATHODE FOR CONTINUOUS DEPOSITION OF AMORPHOUS MATERIAL |
摘要 |
A cathode for use in a glow discharge chamber. A top surface electrode is adapted to provide a substantially uniform distribution of reaction gases at the active surface of an overlying substrate as it advances through the chamber. A plurality of baffles within the cathode creates equal path lengths for reaction gases from their source to the surface electrode and from the surface electrode to a vacuum. The electrode is electrically insulated from a plurality of gas exits so that the generation of plasma is confined solely to a region between the electrode and the active surface of the substrate. |
申请公布号 |
ZA8201709(B) |
申请公布日期 |
1983.02.23 |
申请号 |
ZA19820001709 |
申请日期 |
1982.03.15 |
申请人 |
ATLANTIC RICHFIELD CO |
发明人 |
MASATSUGU IZU;BARNARD T;GATTUSO D;OVSHINSKY H |
分类号 |
H01L31/04;C23C16/509;C23C16/54;H01L21/205 |
主分类号 |
H01L31/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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