| 摘要 |
A thin film treatment apparatus, especially for treatment of viscous materials, which is of the type comprising a rotationally symmetrical treatment chamber which is surrounded by a heating- or cooling jacket and which contains a rotor. The rotor is equipped with material conveying means which are inclined with respect to the axis of rotation of the rotor. Further, the rotor is provided with wiper means which extend generally axially and are arranged in offset fashion with respect to the conveying means in the peripheral or circumferential direction. According to an important aspect of the invention, the conveying means are formed of a plurality of vane stubs arranged in at least one axial row, wherein the confronting ends of neighboring vane stubs, viewed in the axial direction, are spaced from one another and, in each instance, form a gap. Further, the wiper means are offset in trailing fashion with respect to the row of vane stubs through an angle less than 90 DEG in the direction of rotation of the rotor and at least partially bridge/or overlie the gap between neighboring vane stubs.
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