| 摘要 |
PURPOSE:To eliminate the need for measuring extremely small capacitance, currents, etc. and also for difficult operation such as minute positioning, and to inspect the property of each section of an insulator layer, property thereof is not uniform, easily and accurately. CONSTITUTION:The polysilicon layer 14 is formed onto a bird beak section 12' as one example of an electrode for inspection which is selectively controlled in shape covering the section 12' and can be removed through etching, and electrical characteristics between the polysilicon layer 14 and a silicon crystal substrate 11 such as the desired characteristics of relationship between capacitance and voltage, relationship between currents and voltage, etc. and measred. Consequently, information that a region removed through etching has held is given as the information of difference. Accordingly, the etching and measurement of the polysilicon layer 14 are repeated alternately. Aim can be attained positively because the positional accuracy of measurement is determined first by the notches of etching and a technological level concerning the control of etching is high. |
