发明名称 Process for treating stack gases
摘要 Stack gases containing pollutant gases and particulate matter are passed through a defined flow path into which at least one selected liquid reagent is introduced in a prescribed manner to intimately contact the stack gases therein. The liquid reagent scrubs the stack gases and thereby removes a substantial portion of the pollutant gases and particulate matter therefrom. One reagent may be used or several different reagents may be employed at different stages of the flow path to best effect removal of various different pollutants contained within the stack gases. Removal of sulfur dioxide is accomplished by a highly reactive and substantially non-abrasive reagent, such as a lime solution and such solution further effects removal of materials in trace amounts in the stack gases such as mercury, bergillium and vanadium. Removal of nitric oxide and other materials in trace amounts is also accomplished by the process which includes as a reagent an oxidant.
申请公布号 US4369167(A) 申请公布日期 1983.01.18
申请号 US19780868197 申请日期 1978.01.09
申请人 WEIR, JR., ALEXANDER 发明人 WEIR, JR., ALEXANDER
分类号 B01D53/50;(IPC1-7):B01D47/00;B01J8/00;C01B17/00;C01B21/00 主分类号 B01D53/50
代理机构 代理人
主权项
地址