| 摘要 |
PURPOSE:To obtain a high speed electron scanning, by a method, when a square aperture is reduced in shape and projected on an electron sensitive material to display a pattern, wherein a digital scanning and an analog scanning are performed jointly. CONSTITUTION:When a pattern shown in the figure is to be displayed and the electron beam is stopped at a position 11, the electron beam radiation is continued for a predetermined time t1, then the electron beam is shifted and stopped at a position 12 in a time t2 and the radiation is continued for the time t1, and is shifted again to a position 13 after the time t2. In this way the beam is digitally scanned one after another along the circumference of the pattern till the beam reaches a position 14. Then the beam is shifted to a position 15 and scanned till it reaches a position 16 radiating the electron beam to the electron sensitive material. From this position, the beam is shifted without radiating the electron beam to a position 17. From the position 17, the beam is scanned radiating the electron beam similarly till the beam reaches to a position 18, and displays the inside of the pattern by the analog scanning. |
