| 摘要 |
PURPOSE:To enable vacuum evaporation of an annular or L-shaped pattern, by holding a mask provided with a small sperture in a narrow gap apart from a workpiece, and carrying the mask in substantial parallel with the workpiece while doing evaporation through the small sperture. CONSTITUTION:A device is set inside a vacuum evaporator, a wafer 13 is mounted on a wafer-mounting stand 1, and a mask 2 provided with a small aperture 3 is mounted on a mask-supporting stand 4 above the stand 1. In this state, vacuum evaporation is started. An evaprorated substance is deposited through the small sperture 3 onto the wafer 13, while movable stands 8, 11 are shifted at proper apeeds by remote-controlled rotation of a table 5. At this time, the small aperture 3 of the mask 2 is let draw a desired pattern, so that the evaporated substance is deposited as the desired pattern on the wafer 13. Consequently, an annular endless pattern or an L-shaped pattern provided with a rectangular edge can be formed by vacuum evaporation. |
