| 摘要 |
PURPOSE:To reduce the turbulence of the air stream in the chamber and to remove the air positively for the subject mask aliner by a method wherein inert gas is flown out in ring-shape from a wafer chuck, and using this gas, the air in the chamber, including the wafer chuck, is removed. CONSTITUTION:The wafer chuck 33 is shifted relatively to the mask 21 which is supported at the prescribed position and the wafer 49 attracted on the upper surface of the chuck 33 is tightly contacted to the mask 21 by the help of gas pressure. At this time, a disc-shaped chuck main body and the chuck 33, whereon ring-shaped groove is formed on the circumference of the upper surface for blowing out of gas, are used and a pipe and a tube are coupled to the ring- shaped groove. Accordingly, when air bleeds out from the chamber, inert gas is flown out from the groove through the intermediary of the pipe and tube, and the air is positively removed from the chamber. |
