| 摘要 |
PURPOSE:To readily obtain a thin magnetic film having small anisotropic dispersion by disposing a magnetic material in the space between the target of the magnetic material and a substrate and applying a magnetic field in parallel with the surface of the substrate. CONSTITUTION:The composition of a target 1 is decided to contain 81% of Ni and 19% of Fe, a single crystalline substrate 2 and an Fe plate 11 are supported on a holder 8, and the target 1 is magnetically shielded by a plate 10 made of magnetic material containing 78% of Ni and 22% of Fe. A magnetic field is uniformly applied to the surface of the substrate 2 by a Helmholtz coil 4. A cathode 6 on which a high speed sputter magnet 3 having a yoke 5 is mounted is shielded by a ground plate 7. When a film is formed by applying electric power in an Ar atmosphere of approx. DELTAX10<-3> Torr by sputtering, an anisotropic dispersion angle is reduced to less than a half as compared with the conventional magnetron type high speed sputtering method, and a thin magnetic film adapted particularly for a thin magnetic head in which the coercive force and the anisotropic magnetic field are similar to the conventional method can be obtained. |
