| 摘要 |
PURPOSE:To form a high-precision thin-film pattern by controlling the temperature of the mask supporting frame, so that thermal expansion of the mask supporting frame will become equal to that of the thin-film forming substrate. CONSTITUTION:A substrate temperature setter 18 is adjusted before-hand at a temperature favorable for thin-film formation. A substrate temperature comparative controller 17 controls a substrate heating meand 5', while receiving substrate temperature signals from a substrate temperature sensor 6', and thus maintains the substrate temperature at the said favorable temperature. Signals generated by the sensor 6 is also inputted to a mask supporting frame temperatrure comparative controller 19, and at the same time signals generated by the mask supporting frame, temperature sensor 16 is also inputted to the controller 19. Since the mask supporting frame employs materials having a thermal expansion coefficient identical or almost equal to that of the substrate, the setter 20 is adjusted beforehand, so that the temperature difference indicated by sensors 16 and 6' will become 0. Then the controller 19 controls conduction of the sheath heater for the mask supporting frame according to the instructions of the controller 19 and setter 20, thereby equilizing the temperature of the supporting frame and the substrate temperature. |
