| 摘要 |
PURPOSE:To effectively perform etching under high accuracy and high quality by a method wherein an electrode is formed in porous or mesh shape and the flow of etching gas is equalized. CONSTITUTION:A high-frequency voltage is applied across a grounded positive electrode 1 and a negative electrode 2 arranged by facing each other in a reactive tank and reactive gas introduced in the tank is activated to apply etching treatment to processed substances 3 held on the electrode 2. At that time, porous or meshshaped holes 5 are formed at least in the electrode 2 out of each electrode 1, 2. In this way, reactive gas at the time of etching is uniformly supplied toward the electrode 2 and equal etching action can be obtained. |
