摘要 |
PURPOSE:To improve the sensitive characteristic of a photoresist used for forming the pattern of the phosphor screen of a color picture tube, by making the photoresist by mixing a bridging substance composed of a water soluble visazide compound and a water soluble diazo compound in a specific water soluble high molecular material. CONSTITUTION:A substance made by compounding poly(vinylpyrolidone) and poly(vinyl alcohol) at such a rate as the ratio of the former to the latter is the range of 0.5-3.0 to 1 by weight is used as a water soluble high colecular material of a photoresist used for forming the pattern of the nonluminous light absorbing substance coating of a color picture tube. Furthermore, a water soluble bisazido compound and a water soluble diazo compound are used jointly as a bridging substance, where the ratio of the former quantity to the latter is in the range of 3.0-7.0 to 1 by weight. Thereby, as sticking force and sensitivity which are the respective defects of both bridging substances and the thermal stability of a sensitive liquid are improved, a photoresist having a good sensitive characteristic and wide working range can be produced. |