发明名称 Method and an apparatus for thin film formation
摘要 A method and an apparatus for thin film formation using off-set printing techniques, wherein a film-forming material is coated uniformly on a platform, which material is then transferred onto an object on which a thin film is to be formed. Coating the material on the platform is carried out by moving on the platform a roll coater which includes a distributing roller and a coating roller and which feeds the film-forming material onto the platform and by rotating the coating roller in a direction at which slippage in engagement between the coating roller and the platform is always involved in relation with the movement of the roll coater.
申请公布号 US4325995(A) 申请公布日期 1982.04.20
申请号 US19800154997 申请日期 1980.05.30
申请人 HITACHI, LTD. 发明人 TAMURA, YOSHITAKA;ISHITANI, SHIZUO;SHIGEMURA, TAKASHI
分类号 B41F3/81;B05C1/08;B05D1/28;B41F3/20;B41F3/34;B41F7/02;B41F17/00;B41F17/14;B41F17/36;B41F31/02;B41M1/00;B41M1/06;B41M1/34;G03F7/12;(IPC1-7):B05D1/28 主分类号 B41F3/81
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