| 摘要 |
A method and apparatus for controlling a process for the electrodeposition of metals using electrolyte containing concentrations of impurities and addition agents that affect polarization. The method and apparatus include a test circuit comprising a test cell, a sample of electrolyte, a moving cathode, an anode and a reference electrode immersed in said sample, a constant current source and measuring means electrically connected to the electrodes. A controlled low current is applied to the electrodes in the test cell to measure the activation overpotential between the cathode and the reference electrode. The activation overpotential is measured at the point of inchoate deposition of the metal and is related to the concentration of impurities and polarization affecting agents in the sample. The processes for the purification of electrolyte and the electrodeposition of metals are subsequently adjusted in relation to the measured value of the activation overpotential to obtain optimum metal deposition.
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