Liq. dopant for coating substrates with doped oxide layer - esp. where semiconductor wafers are coated with mixt. of ethyl orthosilicate, solvent and boric acid,申请号DE19803030298-传众专利搜索

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发明名称	Liq. dopant for coating substrates with doped oxide layer - esp. where semiconductor wafers are coated with mixt. of ethyl orthosilicate, solvent and boric acid
摘要
申请公布号	DE3030298(A1)	申请公布日期	1982.03.25
申请号	DE19803030298	申请日期	1980.08.09
申请人	LICENTIA PATENT-VERWALTUNGS-GMBH	发明人	KUISL,MAX,DR.RER.NAT.
分类号	C30B31/02;(IPC1-7):30B31/04	主分类号	C30B31/02
代理机构		代理人
主权项
地址

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