发明名称 Bis benzoyl sensitizers for photopolymerization or photo cross linking process and composition
摘要 Aromatic-aliphatic ketones of the formulae I, II, III or IV <IMAGE> I <IMAGE> II <IMAGE> III <IMAGE> IV wherein n is 1 or 2, Ar is an aryl radical, R1 and R2 are monovalent aliphatic, cycloaliphatic or araliphatic radicals, R3 is a direct bond or a divalent organic radical, X is a hydroxyl or amino group or the monovalent etherification or silylation products thereof, and X' is a divalent amino, ether or silyloxy group, Y is a direct bond or CH2 and Z is O, S, SO2, CH2 or C(CH3)2, are suitable sensitizers for the photopolymerization of unsaturated compounds and for the photochemical crosslinking of polyolefins. Some of these compounds are novel and can be obtained by methods analogous to those for obtaining the known compounds of this type.
申请公布号 US4321118(A) 申请公布日期 1982.03.23
申请号 US19790105744 申请日期 1979.12.19
申请人 CIBA-GEIGY CORPORATION 发明人 FELDER, LOUIS;KIRCHMAYR, RUDOLF;HUESLER, RINALDO
分类号 C07C323/31;C03C17/32;C07C45/00;C07C49/213;C07C49/747;C07C49/76;C07C49/82;C07C49/83;C07C49/84;C07C67/00;C07C213/00;C07C225/16;C07C225/20;C07C323/32;C07D295/10;C07D295/108;C07D303/32;C07D333/22;C08F2/00;C08F2/50;C08K5/04;C08K5/07;C08L7/00;C08L21/00;C08L23/00;C08L33/00;C08L33/02;C08L67/00;C08L77/00;C08L101/00;C09D4/00;C09D5/00;C09D11/00;C09D11/10;C09D123/00;G03C1/73;G03F7/028;G03F7/031;(IPC1-7):C08F2/50;C08J3/28 主分类号 C07C323/31
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