发明名称 Ultra-high frequency device for depositing thin films on solids
摘要 A device having means for forming a high frequency excitation zone in an elongated enclosure, a vacuum pump whose connection is positioned at one end of the enclosure, a device permitting the injection into the enclosure of a gaseous mixture containing at least one compound of the substance to be deposited in the vicinity of but outside the excitation zone. The solid on which the deposit is to be made is positioned in the enclosure. The deposition area on said solid is limited to an area of the enclosure outside the high frequency excitation zone in which the gaseous mixture is almost completely decomposed by high energy particles emitted in said zone.
申请公布号 US4320716(A) 申请公布日期 1982.03.23
申请号 US19800150436 申请日期 1980.05.16
申请人 THOMSON-CSF 发明人 BOULANGER, PHILIPPE;KAPLAN, DANIEL;MOURIER, GEORGES
分类号 C23C16/511;H05H1/46;(IPC1-7):C23C13/08 主分类号 C23C16/511
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