发明名称 |
Ultra-high frequency device for depositing thin films on solids |
摘要 |
A device having means for forming a high frequency excitation zone in an elongated enclosure, a vacuum pump whose connection is positioned at one end of the enclosure, a device permitting the injection into the enclosure of a gaseous mixture containing at least one compound of the substance to be deposited in the vicinity of but outside the excitation zone. The solid on which the deposit is to be made is positioned in the enclosure. The deposition area on said solid is limited to an area of the enclosure outside the high frequency excitation zone in which the gaseous mixture is almost completely decomposed by high energy particles emitted in said zone.
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申请公布号 |
US4320716(A) |
申请公布日期 |
1982.03.23 |
申请号 |
US19800150436 |
申请日期 |
1980.05.16 |
申请人 |
THOMSON-CSF |
发明人 |
BOULANGER, PHILIPPE;KAPLAN, DANIEL;MOURIER, GEORGES |
分类号 |
C23C16/511;H05H1/46;(IPC1-7):C23C13/08 |
主分类号 |
C23C16/511 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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