| 摘要 |
PURPOSE:To form a film with a predetermined component in good reproducibility, in the ion plating process of an alloy or a compound formed from two or more of evaporation sources, by arranging a probe electrode in the vicinity of said evaporation sources and monitoring an evaporation amount by probe electric current. CONSTITUTION:A coil like high frequency electrode 4 is placed in a vacuum tank 1 and high frequency electric current is flowed from a power source 3 to generate high frequency plasma. Further, Pd is put in a boat 8 made of W and Ti in an electronic beam heating and evaporating source 9 and Pd and Ti are evaporated to be ionized by the high frequency plasma and heated by a heater 5 and the resultant ionized vapor is accelerated and impinged to a substrate plate 6 applied to voltage of 500- 1,000V by an accelerating power source 7 to form a Pd-Ti alloy film. In this time, probes 12, 14 to which positive voltage is applied are provided in front of the evaporation sources 8, 9 and electric current passed therethrough is monitored by ammeters 15, 13 to control voltage so as to adjust said electric current to a predetermined value. The evaporation amount of Pd and Ti from each evaporation sources 8, 9 is appropriately controlled and a Pd-Ti alloy film with a predetermined component is formed on the substrate plate 6 in good reproducibility. |
